DNA damage and repair system

Deep UV Microscopy


Standard microscopes do not transmit light below ca. 320 nm due to the low transmission of their optics and objectives at these wavelengths. For applications like:
  • imaging and/or fluorescence excitation below 320 nm
  • DNA damage and repair studies at 266 nm
  • photoactivation
  • measurement of spatially resolved UV absorption spectra (OSD)


we offer a complete solution, including:
  • modification of the microscope pathway to transmit deep-UV wavelengths
  • quartz objectives
  • dichroic mirrors suitable for UV
  • light sources
  • UV-sensitive cameras


In vivo DNA damage at 266 nm


     Source: C. Dinant et al. (2007), Dept. of Pathology, Josephine Nefkens Institute, ErasmusMC (Rotterdam; Netherlands)


  • Localized DNA damage in the cell nucleus was induced using a 266 nm laser (DL-266) and an AiWon device
  • The cells expressed GFP tagged repair factor GFP-XPA to follow the nucleotide excision repair (NER) mechanism
  • Arrow / Arrow head = accumulation of repair protein after after irradiation with two different laser intensities
      

In vivo DNA damage at 355 nm


UGA-40-4-Laser-System (355 nm, 405 nm, 473 nm and 542 nm) on Zeiss Spinning Disc Confocal



UV Lasers: 266 nm, - DPSL-266


Applications

  • Photolysis
  • DNA damage
  • UV fluorescence excitation
  • UV illumination
  • Microdissection


Features

  • 266 nm YAG laser
  • Average power 2 mW
  • Repetition rate up to 10 kHz
  • Manual intensity adjustment
  • Coupling via optical fiber light guide
  • Remote control
  • Turn-key system




Contact us Address :RM617, 6/F. Office Tower A, Beijing Fortune Plaza, 7 Dongsanhuan Zhong Road, Chaoyang District, Beijing City ,100022,China 中国北京市朝阳区东三环中路7号 北京财富中心写字楼A座6层617室 Telephone:010- 65129207 Fax :010- 65129207 Email :tim_liuyi@aliyun.com , tim@hktimwinter.com 京ICP备15043433号-1